Modeling > Feature Modeling > Pattern and copy features > Pattern Face
Pattern Face
Pattern Face
Use the Pattern Face command to create patterns of faces in various pattern layouts and define pattern boundaries, reference points, orientation, and clocking.
You can create a pattern of faces using a variety of pattern layouts.
| Linear | Polygon | Along | Reference |
|---|---|---|---|
| Circular | Spiral | General | Helix |
You can fill a specified boundary with a pattern of faces.
For a Linear layout, you can specify a Symmetric pattern in one or both directions. You can also specify to Stagger columns or rows.
For Linear and Along layouts, you can create a pattern along selected points by setting Spacing to Points, which lets you control where you place instances.
For a Circular or Polygon layout, you can choose to radiate a pattern.
You can define a Pattern Increment by using expressions to specify pattern parameters.
You can export pattern parameter values to a spreadsheet and make positional edits that are propagated back to your pattern definition.
You can explicitly select individual instance points for deletion or for clocking instances to different locations.
| Patterned feature | Selected instances |
|---|---|
| Delete Multiple instances of the pattern can be deleted at one time. | Clock Each move shown above is a separate clocking operation. |
You can control the orientation of a pattern.
| Same As Input | Follow Pattern (circular) |
|---|
The Pattern Face command differs from the Pattern Feature command in the following ways:
- You can select a set of faces to copy instead of features.
- The result is a single feature instead of instanced copies of features, so feature creation and editing are faster.
Pattern Face is especially useful when working with imported solid models when there are no features in the model to pattern.
The Pattern Face command is a Modeling command that is included in the Sheet Metal application for the convenience of users. Use it for performance reasons in typical patterning operations where the required result is a large number of pattern objects. For example, patterning a large number of holes, cutouts, dimples, or louvers, on a tab face.
However we do not recommend using in all cases as a substitute for the regular patterning commands in Sheet Metal, because it can cause downstream problems with various sheet metal features such as unbend, rebend, flat solid, copy, paste, and mirror. In these cases, while it may work, it can produce different downstream behavior. For example, a series of flanges that are patterned using the Pattern Face command will unbend and rebend together.
Where do I find it?
| Application | Modeling, Shape Studio, Pre/Post, and Manufacturing |
|---|---|
| Command | Pattern Face |
Create a grip pattern on a knob sleeve
| This example shows how to pattern the faces of protrusions and recesses to create a grip pattern on a cylindrical sleeve for a knob. |
|---|
Choose Home tab→Base group→Pattern Face .
Select the faces as shown.
In the Pattern Definition group, from the Layout list, select or confirm Circular .
Middle-click to advance.
In the Rotation Axis subgroup, with Specify Vector active, specify an axis of rotation for the circular pattern.
For this example, the Z axis of the OrientXpress tool is selected.
With Specify Point active, specify a rotation point.
For this example, the arc center of the bottom edge is selected to specify a rotation point.
In the Angular Direction subgroup, set the pattern spacing parameters.
For this example they are set as shown:
- Spacing = Count and Span
- Count = 10
- Span Angle =360
Note: Press Enter after specifying a parameter to display the effect of that parameter on the pattern.
Click OK.
In this case, why use Pattern Face instead of Pattern Geometry or Pattern Feature?
**Pattern Feature **can be used in this situation, but all the construction geometry that went into creating the initial features would also be instanced with the pattern, creating a more complex part.
Pattern Geometry is not used because it cannot accommodate the Boolean operation that creates the lower indentations.
Create a rectangular pattern of boss faces
| This example shows how to create a linear pattern of the faces of a boss in two directions to create a rectangular pattern of connection bosses. |
|---|
Choose Home tab→Base group→Pattern Face .
Select the faces to pattern.
In the Pattern Definition group, from the Layout list, select or confirm Linear .
Middle-click to advance.
In the Direction 1 subgroup, with Specify Vector active, specify an axis for the first direction of the pattern.
Set the pattern spacing parameters.
For this example they are set as shown:
- Spacing = Count and Pitch
- Count = 3
- Pitch Distance =20
Press Enter after specifying a parameter to display the effect of that parameter on the pattern.
In the Direction 2 subgroup, select the Use Direction 2 check box .
With Specify Vector active, specify an axis for the second direction of the pattern.
Set the pattern spacing parameters.
For this example they are set as shown:
- Spacing = Count and Pitch
- Count = 3
- Pitch Distance =20
An Alert message displays because the reference point of the center instance is located in hole, or void area, that specific instance could not be patterned.
The Pattern Face operation can be completed now, but there will be an Alert graphic on the respective Part Navigator node.
The instance reference point can also be deleted if it is not needed.
Right-click on the center reference point and select Delete.
Click OK.
| In the Part Navigator, the Pattern Face node graphic is updated . |
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Create a circular pattern of holes from an existing pattern
| This example shows how to create a circular pattern of holes. To do this, we find a pattern of holes by finding clones of an existing hole, and then use that pattern to create a more complex pattern. |
|---|
- Choose Home tab→Base group→Pattern Face .
- Select Hole Faces from the Face Rule list on the scene toolbar.
- Select the hole face to pattern.
- In the Face group, in the Face Finder subgroup, select the Find Clone check box.
- In the Face Finder subgroup, in the Found tab, point to an option in the list.
For this example, move the cursor over Pattern.
NX highlights the hole faces that are in a pattern. 6. In the Face Finder subgroup, in the Found tab, select the Pattern check box. 7. In the Pattern Definition group, from the Layout list, select Circular . 8. In the Rotation Axis subgroup, with Specify Vector active, specify an axis for the direction of the pattern. 9. With Specify Point active, specify a rotation point.
For this example, we select the arc center of the upper edge to specify the rotation point. 10. Set parameters for spacing the pattern.
For this example:
Spacing = Count and Pitch 11. Count = 3 12. Pitch Angle =20 13. Click OK.
Pattern Face dialog box
| Face |
|---|
| Select Face |
| Face Finder |
| Reference Point |
| Specify Point |
| Pattern Definition |
| Layout |
Boundary Definition
Not available when Layout is set to Along, General, Reference, or Helix.
Boundary Definition addresses objects that lie in close proximity to or on the surface being patterned, such as holes or repeated detail geometry. Using Boundary Definition with objects whose centroids or instance points are positioned away from the target surface may yield unexpected results.
Boundary
Does not define boundaries. Patterns are not restricted to boundaries.
Lets you select face edges, sheet edges, or region boundary curves to define the pattern boundary.
You can also select faces to be used to define the orientation by following the face normal, much like with the Follow Face orientation option. The faces you select to define the boundary are also reused to define the orientation for Follow Face.
In such a case, NX attempts to space the instances with the pitch distance calculated along the curvature of the boundary face instead of in the Pattern Layout, such as Linear spacing. This allows for the pattern layout, such as Linear, to approximate the surface being followed.
Note that the instance spacing is also dependent on the type of faces being selected, so it will be different when you map curved faces versus planar faces.
Lets you select a set of curves, or create a sketch to define the pattern boundary.
Lets you select curves or create a sketch to define an area that is excluded from patterning.
Patterns created with a boundary definition are highly sensitive to the Reference Point location. If the reference point calculated for a given instance lies outside the boundary, the instance is not created, but the actual geometry created for the instances might overlap the boundary, as seen below.
Simplified Boundary Fill
Available when Layout is set to Linear, Circular, Polygon or Spiral and Boundary is set to Face or Curve.
Displays the Simplified Layout subgroup of options that you can use to fill the specified boundary with instances. The available options depend on the Layout option that you select. You do not need to input as much information to create the instances.
Lets you form a grid for the simplified linear layout pattern, using the Square, Triangle, or Diamond options on the Layout list. The designated layout is repeated until the boundary is filled.
| Square | Triangle | Diamond |
The Radial Pitch option is unique to circular and polygonal simplified boundary fills. It lets you control the concentric distance of the pattern faces as they radiate out.
| Circular | Polygon |
Margin Distance
Lets you specify an offset distance from the defined boundaries.
Apply Margin to Internal Boundaries
Available when Layout is set to Linear, Circular, Polygon or Spiral and Boundary is set to Face or Curve.
Adds the specified margin distance to any internal boundaries. Any pattern face that encroaches into the margin distance area will not be displayed.
Rotation Angle
Lets you specify a rotation angle for the simplified layout based on the defined reference vector.
Pattern Definition layout parameters
Pattern definition parameters vary based on layout.
There are also parameters common to all layouts.
Use the Look up more details links for specific layout options information.
Pattern Increment
Pattern Increment
Opens the Pattern Increment dialog box where you can define increments to be applied to instances as the pattern count increases.
Instance Points
Select Instance Point
Lets you select points that represent the layout, pattern definition and orientation of the instances that are to be created.
Use the Snap Point options on the scene toolbar to filter point selection
When you right-click an instance point, the following options are available.
Delete removes the selected instance from subsequent pattern face operations. A small red sphere indicates that the pattern instance is deleted.
Deleting instance points and the pattern instances attached to them does not affect the Spacing / Count parameter specification. For example, a 3 x 3 linear layout with its last column of instances deleted is still a 3 x 3 layout, not a 2 x 3 layout.
Undelete adds the selected instance back into the pattern face.
Displays the Clocking dialog box where you can specify instance points to edit, and then define a delta position and orientation for the specified instance points.
Clocking is also available from the Operation Navigator by right-clicking an instance and choosing Clock.
Unclock returns selected clocked instances to their original locations.
The above options are also available using the Part Navigator.
Use Spreadsheet
Not available when Layout is set to Reference.
Lets you edit pattern definition parameters, including any pattern-variance settings, only in a spreadsheet.
After you confirm your values, they are read back to the dialog box and the geometry is updated.
The spreadsheet is not stored with the pattern.
If you want to edit the pattern definition parameters in the dialog box, clear the Use Spreadsheet check box.
Orientation
Orientation
Not available when Layout is set to Reference.
Determines if the pattern faces in the layout will maintain a constant orientation or follow an orientation derived from some defining geometry.
| Orients the pattern faces in the same orientation as the input face. |
|---|
| Not available when Layout is set to Linear or Reference. Orients the pattern faces following the orientation of the layout. |
|---|
| Available when Layout is set to Along. Orients the pattern faces based on the normals or projected normals of the specified path. |
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| Not available when Layout is set to Along, General, or Reference. Orients the pattern faces based on a specified CSYS. |
|---|
Follow Face
Not available when Layout is set to Reference.
Maintains an orientation for the pattern faces that is normal to the specified face at the location of the instance.
The specified faces have to be on the same body.
Project Direction
Available when Follow Face is selected.
The locations of the instances on the pattern plane will be projected normal from the pattern plane to the specified face.
The locations of the instances on a pattern face will be projected normal from the pattern face to the specified face.
The locations of the instances will be projected along a specified vector to the specified face.
Pattern Settings
Available when Layout is set to Linear, Circular or Along.
Settings
Copy Chamfer Labels
Lets you copy the chamfer labels on unparameterized angled faces and have them applied in the resulting pattern.
Copy Threads
Lets you copy symbolic threads so that you do not need to recreate additional symbolic threads that look the same as the source body.
The positive or negative disposition of extracted symbolic threads is maintained in subsequent patterning of those threads.
This is useful for copied bodies in CAM and Drafting.
Linear layout options
| Pattern Definition – Linear layout |
|---|
| Pattern Settings |
Circular layout options
| Pattern Definition – Circular layout |
|---|
| Radiate |
| Pattern Settings |
Along layout options
| Pattern Definition – Along layout |
|---|
| Pattern Settings |
Linear layout options
| Pattern Definition – Linear layout |
|---|
| Pattern Settings |
Circular layout options
| Pattern Definition – Circular layout |
|---|
| Radiate |
| Pattern Settings |
Polygon layout options
| Polygon Definition – Polygon layout |
|---|
| Radiate |
| Create Concentric Members |
Spiral layout options
| Pattern Definition – Spiral layout |
|---|
| Spiral |
Along layout options
| Pattern Definition – Along layout |
|---|
| Pattern Settings |
Path methods for the Along layout
| Path Methods |
|---|
General layout options
| Pattern Definition – General layout |
|---|
| General |
Reference layout options
| Pattern Definition – Reference layout |
|---|
Helix layout options
| Pattern Definition – Helix layout |
|---|
| Part shown translucent to show pattern |
Common pattern definition options
| Definition parameter | Available in layouts |
|---|---|
| Count Sets the number of instances (including the origin object) for the pattern. Available when Spacing is set to one of the following: Count and Pitch Count and Span Count per Side | Linear Circular Polygon Along |
| Pitch Distance / Pitch Angle |
This parameter appears when Spacing is set to one of the following:
Count and Pitch
Pitch and Span
Linear
Circular
This parameter appears when Spacing is set to one of the following:
Count and Span
Pitch and Span
Linear
Circular
Available when spacing is based on arc length and requires a distance input.
Available when spacing is based on a percentage of arc length.
This parameter appears when Spacing is set to one of the following:
Count and Pitch
Pitch and Span
Along
Available when spacing is based on a fixed distance of arc length.
Available when spacing is based on a fixed percentage of arc length.
This parameter appears when Spacing is set to one of the following:
Count and Span
Pitch and Span
Along
Arc Length – Bases pitch or span spacing of the instances on the distance of the specified arc length of the path.
% Arc Length – Bases pitch or span spacing of the instances on the percentage of the specified arc length of the path.
This parameter appears when Spacing is set to one of the following:
Count and Pitch
Count and Span
Pitch and Span
Along
Defines spacing by a list of values and a count. The values in the list are repeated if necessary until the total count is reached.
| Spacing 1 | Value = 150.000 |
|---|---|
| Spacing 2 | Value = 60.000 |
| Spacing 3 | Value = 60.000 |
- Linear
- Circular
- Along
Defines spacing by the points you select. The spacing between points can vary.
This parameter appears when Spacing is set to Points.
- Linear
- Along
Reference points
When you specify an object or objects to pattern, a location is inferred or can be explicitly defined, which is used as the pattern origin to compute the locations of the pattern instances. This location is called the pattern Reference Point and is shared by the Pattern Feature, Pattern Face, Pattern Geometry, and Pattern Body commands.
Any pattern of objects created is not associative to the reference point in terms of location. This means, if you move the reference point, the pattern will not transform. To transform a pattern, clocking or variance must be applied.
How the Reference point is determined
For single curves, the centroid of the curve is used.
For multiple curves, the centroid of the set of curves is used.
For single faces, the centroid of the face is used.
For multiple faces, the centroid of all faces is used.
For a single body, the centroid of that body is used.
| side view |
|---|
For multiple bodies, the centroid of all the faces of the bodies is used.
| side view |
|---|
For objects that modify an existing body, such as a pattern that is subtracted from a body, the centroid of the set of faces modified by the object is used. In this example, the center of the bottom faces of the subtracted object.
| side view |
|---|
The centroid point on the datum object is used
Reference point considerations
- If you override the inferred reference point location, the initial inferred location cannot be retrieved unless you reset the dialog box and re-select the input geometry.
- If you override the inferred reference point by selecting geometry, such as an endpoint of a line, the reference point is associative to the selected geometry.
- The instance locations of the pattern are reprocessed each time a reference point is re-specified.
- As a best practice, use Show Result in the respective pattern command dialog box to preview the actual result of the pattern.
- You may get unexpected results when creating a pattern along a path using the Along layout or on a surface using Face Finder where the reference point is a distance away from the target and is projected to the target.
It is a good practice to specify a reference point location on the path or surface for more predictable results.
Please see Path methods for the Along layout for more information.
Spacing options by layout
| Layout | Spacing | Parameters |
|---|---|---|
| Linear | Count and Pitch Count and Span Pitch and Span | Count Pitch Distance Span Distance |
| List | Count Spacing Value | |
| Points | Specify Points | |
| Circular | Count and Pitch Count and Span Pitch and Span | Count Pitch Angle Span Angle |
| List | Count Spacing Value | |
| Polygon | Count per Side Pitch along Side | Number of Sides Count (Count per Side only) Pitch (Pitch along Side only) Span |
| Spiral | Number of Turns Total Angle | Turns (Number of Turns only) Angle (Total Angle only) Radial Pitch Pitch along Spiral Reference Vector Rotation Angle |
| Along | Count and Pitch Count and Span Pitch and Span | Count Location Pitch By % Pitch By Span By % Span By |
| List | Count Spacing Value | |
| Points | Specify Points | |
| Helix | Count, Angle, Distance Count, Helix Pitch, Turns Count, Helix Pitch and Span Angle, Helix Pitch, Turns Angle, Helix Pitch and Span | Count Angle Helix Pitch Helix Span Distance Turns (Number of Turns only) |
Pattern modeling in NX
In Modeling, you can use four basic commands to pattern geometry.
Available only when a sketch is active.
Copies a chain of sketch curves that lie in a sketch plane, into a specified pattern layout.
If you select non-sketch geometry such as edges, curves, points, and section segments, the selected geometry is projected onto the sketch plane, ready to pattern as sketch geometry.
Copies geometry such as points, datums, curves, bodies, faces, and CSYS into a specified pattern layout. You can set options for pattern boundary, instance orientation, and positioning.
Pattern Geometry is useful for extracting and duplicating various objects such as datums, curves, faces, and solid bodies. Such objects may not be listed as features so Pattern Feature cannot be used.
Copies a set of faces into a specified pattern layout with various options for pattern boundary, instance orientation, and positioning, and then adds it to a body.
Pattern Face is especially useful when working with imported solid models when there are no features in the model to pattern. Feature creation and editing are faster because Pattern Face does not create individual instances as does Pattern Feature.
Copies features such as sketches, datums, curve features, and welding and measurement objects into a specified pattern layout with various options for pattern boundary, instance orientation, clocking and deleting, and variance.
Pattern Feature allows patterning of established features. It is useful when working with patterns where one or more of the instances of the pattern needs to vary in some way from the other instances. Individual instances of the pattern can be modified.
Pattern commands matrix
| Pattern Curve | Pattern Face | Pattern Feature | Pattern Geometry | |
|---|---|---|---|---|
| Requirements | Sketch must be active. | Must have existing body to add faces to. | Must have existing features as the source of the pattern. | Must have existing geometry as the source of the pattern. |
| Works with | Sketch objects | Faces | Curve Features Sketches Features Datums Welding Objects Body in White Datums Measurement Objects | Points Curves Edges Faces Sheet Bodies Solid Bodies Datums CSYS |
| Layouts that can be created | Create Inferred Constraints ON | Create Inferred Constraints OFF | Linear Circular Polygon Spiral Helix Along curve chain General target points Reference to another pattern | Linear Circular Polygon Spiral Helix Along curve chain General target points Reference to another pattern |
| Linear Circular General target points | Linear Circular Polygon Spiral Along curve chain General target points Reference to another pattern | |||
| Clocking of instances | no | yes | yes | yes |
| Deleting of instances | no | yes | yes | yes |
| Suppressing of instances | no | no | no | yes |
| Specifying variance on instances | no | no | no | yes |
| Notes | Selected non-planar geometry is projected onto sketch plane. | Adds patterned faces to existing body. Does not create individual instances. Easy to edit pattern. | Creates individual instances of features. Output can be a pattern feature, copies of the input features as individual features, or a feature group containing copies of the input feature as individual features. Individual instances can be modified. | Extracts and duplicates objects. Instances can be associative or non-associative. Instances can inherit threads. |
| Result | New curves in the sketch are geometrically constrained to the source curves. | One feature | A feature for each instance in the pattern. | One feature |
| Limitations | Can only be used with objects in a sketch. | Sews the resulting pattern instances to the selected face, so all of the resulting pattern instances must intersect the selected face. | Uses Boolean operations to join the resulting pattern, so all pattern instances must intersect the solid body. | Few limitations because the result does not require a Boolean operation. |
Reference points
When you specify an object or objects to pattern, a location is inferred or can be explicitly defined, which is used as the pattern origin to compute the locations of the pattern instances. This location is called the pattern Reference Point and is shared by the Pattern Feature, Pattern Face, Pattern Geometry, and Pattern Body commands.
Any pattern of objects created is not associative to the reference point in terms of location. This means, if you move the reference point, the pattern will not transform. To transform a pattern, clocking or variance must be applied.
How the Reference point is determined
For single curves, the centroid of the curve is used.
For multiple curves, the centroid of the set of curves is used.
For single faces, the centroid of the face is used.
For multiple faces, the centroid of all faces is used.
For a single body, the centroid of that body is used.
| side view |
|---|
For multiple bodies, the centroid of all the faces of the bodies is used.
| side view |
|---|
For objects that modify an existing body, such as a pattern that is subtracted from a body, the centroid of the set of faces modified by the object is used. In this example, the center of the bottom faces of the subtracted object.
| side view |
|---|
The centroid point on the datum object is used
Reference point considerations
- If you override the inferred reference point location, the initial inferred location cannot be retrieved unless you reset the dialog box and re-select the input geometry.
- If you override the inferred reference point by selecting geometry, such as an endpoint of a line, the reference point is associative to the selected geometry.
- The instance locations of the pattern are reprocessed each time a reference point is re-specified.
- As a best practice, use Show Result in the respective pattern command dialog box to preview the actual result of the pattern.
- You may get unexpected results when creating a pattern along a path using the Along layout or on a surface using Face Finder where the reference point is a distance away from the target and is projected to the target.
It is a good practice to specify a reference point location on the path or surface for more predictable results.
Please see Path methods for the Along layout for more information.
Source: https://docs.sw.siemens.com/en-US/doc/209349590/PL20220512394070742.modeling/modeling_pattern_face_ov · retrieved 2026-07-10